Share Email Print
cover

Proceedings Paper

Laser Created X-Ray Sources For Microlithography
Author(s): M. Chaker; H. Pepin; V. Bareau; S. Boily; B. Lafontaine; R. Fabbro; I. Toubhans; B. Faral; J. F. Currie; D. Nagel; M. Peckerar
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Laser created X-ray sources have been investigated both theoretically and experimentally using λ = 1.06 μm and λ = 0.26 μm and short pulses (0.5 nsec). Some preliminary results are given with UV radiation obtained with a long pulse (25 nsec) excimer laser. The con-version efficiency of the X-ray emission in the sub-keV (0.1-0.75 keV) and keV (0.75-2 keV) ranges is given for various atomic numbers and a large range of laser intensities. Using these results and resist sensitivities, we discuss the characteristics of the laser required for X-ray lithography.

Paper Details

Date Published: 1 January 1986
PDF: 7 pages
Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); doi: 10.1117/12.964892
Show Author Affiliations
M. Chaker, Universite du Quebec (Canada)
H. Pepin, Universite du Quebec (Canada)
V. Bareau, Universite du Quebec (Canada)
S. Boily, Universite du Quebec (Canada)
B. Lafontaine, Universite du Quebec (Canada)
R. Fabbro, Laboratoire du CNRS (France)
I. Toubhans, Laboratoire du CNRS (France)
B. Faral, Laboratoire du CNRS (France)
J. F. Currie, Ecole Polytechnique (Canada)
D. Nagel, Naval Research Laboratory (United States)
M. Peckerar, Naval Research Laboratory (United States)


Published in SPIE Proceedings Vol. 0733:
Soft X-Ray Optics and Technology
E. Koch; Guenther A. Schmahl, Editor(s)

© SPIE. Terms of Use
Back to Top