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Proceedings Paper

Capability Of Kinetic Ellipsometry As An In Situ Control System For Ultra Thin Layers Stacks Growth: Application To The Realization Of Performant Soft X Ray Optics
Author(s): P. Houdy; V. Bodart; L. Nevot; D. Corno; B. Pardo; M. Arbaoui; N. Alehyane; R. Barchewitz; Y. Lepetre; E. Ziegler
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Paper Abstract

Diode RF sputtering technique has been used to produce carbon tungsten ultra thin layers stacks for application in the soft X-ray donain as optical system. In situ kinetic ellipsometry has been chooser to control the multilayers growth with a great accuracy. Grazing X-ray reflection (1.54 Å), absolute soft X-ray reflectivity (44.7 Å) and electron microscopy results confirm a posteriori the ellipsometry capabili-ties. The stacks have low roughness (2 Å) and low periodicity errors (2 %), 13 % experimental reflectivity instead of 20 % theoretical (2 d = 90 Å) and 7 % instead of 12 % (2 d = 60 Å) have been obtained.

Paper Details

Date Published: 9 April 1987
PDF: 7 pages
Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); doi: 10.1117/12.964832
Show Author Affiliations
P. Houdy, Laboratoires d'Electronique et de Physique Appliquee (France)
V. Bodart, Laboratoires d'Electronique et de Physique Appliquee (France)
L. Nevot, Institut d'Optique Theorique et Appliquee (France)
D. Corno, Institut d'Optique Theorique et Appliquee (France)
B. Pardo, Institut d'Optique Theorique et Appliquee (France)
M. Arbaoui, Universite Pierre et Marie Curie (France)
N. Alehyane, Universite Pierre et Marie Curie (Finland)
R. Barchewitz, Universite Pierre et Marie Curie (France)
Y. Lepetre, Argonne National Laboratory (United States)
E. Ziegler, Argonne National Laboratory (United States)


Published in SPIE Proceedings Vol. 0688:
Multilayer Structures & Laboratory X-Ray Laser Research
Natale M. Ceglio; Pierre Dhez, Editor(s)

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