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Proceedings Paper

Fabrication and Evaluation of Mo-Si Multilayer Mirrors for Soft X-Rays
Author(s): Masaki Yamamoto; Akira Arai; Masayuki Watanabe; Takeshi Namioka
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Paper Abstract

Mo-Si multilayers were fabricated by means of ion-beam sputtering. The reflectances of Mo-Si multilayers, single layers of Mo and Si, and a glass substrate were measured for s-polarization with synchrotron radiation. The peak reflectance of the best Mo-Si multilayer was 17.5% at 13.7 nm. The optical constants of Mo, Si and BK7 glass obtained from the reflectance data are given at a wavelength region of 12nm (104eV) to 20nm (62.3eV).

Paper Details

Date Published: 9 April 1987
PDF: 5 pages
Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); doi: 10.1117/12.964828
Show Author Affiliations
Masaki Yamamoto, Tohoku University (Japan)
Akira Arai, Tohoku University (Japan)
Masayuki Watanabe, Shimadzu Corporation (Japan)
Takeshi Namioka, Tohoku University (Japan)

Published in SPIE Proceedings Vol. 0688:
Multilayer Structures & Laboratory X-Ray Laser Research
Natale M. Ceglio; Pierre Dhez, Editor(s)

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