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Proceedings Paper

Deposition, Characterization, And Simulation Of Thin Films With Form Birefringence
Author(s): M. R. Jacobson; F. Horowitz; Bangjun Liao
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Paper Abstract

Birefringence in optical thin films due to structure on a scale large compared to atoms but small compared to optical wavelengths, known as form birefringence (FB), was observed almost a century ago. More recently, studies of obliquely deposited metal films stimulated new interest in birefringent films. The link between structure, which is predominantly columnar in evaporated thin films, and birefringence has been conclusively demonstrated through ellipsometric measurement and modeling. Direct measurements of form birefringence are especially tedious in tilted films, since essentially four quantities must be derived: three indices of refraction and the film thickness. Clearly, four measurements are required; Horowitz' used an ellipsometric method to perform such measurements on a zirconium oxide (Zr02) film. Later, a 4.6-μm-thick film of Zr02 was obliquely deposited; spectrophotometric measurements revealed its utility as a half-wave plate. A parallel effort directed at understanding FB films through computer simulations has been undertaken by Sikkens and Liao. These simulations can be specialized to include defects, epitaxy, and anisotropic surface mobility. Applications of obliquely deposited FB films of familiar thin film materials can be anticipated if their structure and performance can be more thoroughly understood.

Paper Details

Date Published: 26 December 1984
PDF: 8 pages
Proc. SPIE 0505, Advances in Optical Materials, (26 December 1984); doi: 10.1117/12.964651
Show Author Affiliations
M. R. Jacobson, University of Arizona (United States)
F. Horowitz, University of Arizona (United States)
Bangjun Liao, University of Arizona (United States)

Published in SPIE Proceedings Vol. 0505:
Advances in Optical Materials
Solomon Musikant, Editor(s)

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