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Proceedings Paper

Evaluation of molecular contaminants in the micro-environment between photomask and pellicle using analysis tool
Author(s): Mina Douzono; Itsuka Shimada; Tatsuji Ueda; Tatsuo Nonaka; Yukihiro Kawano; Masashi Murakami
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Paper Abstract

The problem of haze and related defects become more serious as the dimension of lithography becomes smaller. It has been reported that the causes of haze defects are organic and inorganic molecular contamination deposited on mask surface. These haze problems influence the productivity of lithography process, but the formation mechanism of haze has not been clear. So it is important to understand chemical composition and formation mechanism of haze to prevent it. To analyze the chemical composition, several analytical techniques are useful, that is, ion chromatography (IC) or gas chromatography mass spectrometer (GC/MS) after liquid extraction of mask surface, surface analysis such as time-of-flight secondary ionization mass spectrometry (TOF-SIMS), X-ray photon spectrometry (XPS) and so on. However, these techniques are all destructive methods and are difficult to evaluate the airborne molecular contaminants (AMCs) with high sensitivity between mask and pellicle. We have successfully developed new and sensitive analysis tool consists of two parts and applied it for the evaluation of micro-environment between photomask and pellicle. One is the equipment to collect AMCs effectively, that provides diagonal two holes with needles on the pellicle to collect the gas while ventilating the high-purity nitrogen gas. The other is sampler which is named BremS™ to collect and measure exhausted AMCs in the space with high sensitivity. We applied this method to masks with different exposure dosage rate and introduce the usefulness of our method.

Paper Details

Date Published: 30 June 2012
PDF: 7 pages
Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 844110 (30 June 2012); doi: 10.1117/12.964406
Show Author Affiliations
Mina Douzono, Sumika Chemical Analysis Service, Ltd. (Japan)
Itsuka Shimada, Sumika Chemical Analysis Service, Ltd. (Japan)
Tatsuji Ueda, Sumika Chemical Analysis Service, Ltd. (Japan)
Tatsuo Nonaka, Sumika Chemical Analysis Service, Ltd. (Japan)
Yukihiro Kawano, Sumika Chemical Analysis Service, Ltd. (Japan)
Masashi Murakami, Sumika Chemical Analysis Service, Ltd. (Japan)


Published in SPIE Proceedings Vol. 8441:
Photomask and Next-Generation Lithography Mask Technology XIX
Kokoro Kato, Editor(s)

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