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Proceedings Paper

Generating well-behaved OASIS files for mask data processing
Author(s): D. Hung; J. P. Canepa; K. Kuo; J. G. Jou
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Paper Abstract

Since the introduction of OASIS 1.0, the OASIS file format has gradually become adopted across the semiconductor manufacturing industry for advanced technology nodes. However, within the range of possible OASIS format options, choices made during file creation can result in inefficiencies in mask data processing. This paper starts by pointing out the relation between generating OASIS files and mask data preparation runtime. We then present some strategies and methodologies on generating well-behaved OASIS files. We conclude with some comments on the OASIS standard for the future.

Paper Details

Date Published: 8 November 2012
PDF: 8 pages
Proc. SPIE 8522, Photomask Technology 2012, 85220V (8 November 2012); doi: 10.1117/12.964293
Show Author Affiliations
D. Hung, Synopsys, Inc. (United States)
J. P. Canepa, Synopsys, Inc. (United States)
K. Kuo, Synopsys, Inc. (United States)
J. G. Jou, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)

Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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