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Proceedings Paper

Mechanisms Of Contamination In Photochemical Deposition Or Thin Metal Films
Author(s): K. A. Singmaster; F. A. Houle; R. J. Wilson
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Paper Abstract

Systematic investigations of thin Cr, Mo and W films deposited from the hexacarbonyls with low power, cw UV light have been carried out in order to learn about sources of contamination by C and 0 (luring film growth. Dissociative chemisorption of CO from the precursor, reactions with oxygen-containing background gases during deposition and air alter deposition all affect film compositions. Laser heating can also he important. General aspects of film contamination are discussed for other precursors such as the alkyls and acetylacetonates, and compared to the present data.

Paper Details

Date Published: 23 February 1990
PDF: 6 pages
Proc. SPIE 1190, Laser/Optical Processing of Electronic Materials, (23 February 1990); doi: 10.1117/12.963989
Show Author Affiliations
K. A. Singmaster, IBM Research Division (United States)
F. A. Houle, IBM Research Division (United States)
R. J. Wilson, IBM Research Division (United States)

Published in SPIE Proceedings Vol. 1190:
Laser/Optical Processing of Electronic Materials
Jagdish Narayan, Editor(s)

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