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Proceedings Paper

Surface Radiation Characteristics In RTCVD Temperature Measurement/Control
Author(s): F. Y. Sorrell; J. A. Harris; M. C. Ozturk; J. J. Wortman
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Paper Abstract

The effect of the surface emissivity on lamp power and the measured pyrometer temperature is investigated by computer simulation. First, the effect of changing emissivity on wafer tempera-ture at constant lamp power (open loop control) during rapid thermal chemical vapor deposition (RTCVD) is demonstrated both experimentally as well. as simulated. Following this validation of the simulation, three control techniques are proposed which will maintain a constant wafer temperature during processing. These techniques still use a pyrometer or pyrometers as the temperature sensor(s). A control algorithm is developed for one of the techniques. The use of this algorithm is demonstrated via the computer simulation.

Paper Details

Date Published: 6 April 1990
PDF: 11 pages
Proc. SPIE 1189, Rapid Isothermal Processing, (6 April 1990); doi: 10.1117/12.963956
Show Author Affiliations
F. Y. Sorrell, N. C. State University (United States)
J. A. Harris, N. C. State University (United States)
M. C. Ozturk, N. C. State University (United States)
J. J. Wortman, N. C. State University (United States)

Published in SPIE Proceedings Vol. 1189:
Rapid Isothermal Processing
Rajendra Singh, Editor(s)

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