Share Email Print
cover

Proceedings Paper

Ultrashallow Diffused Emitter-Base Profiles For Bipolar Device Applications Using Rapid Thermal Processing
Author(s): J. E. Turner; C. I. Drowley; P. Vande Voorde; S. J. Rosner; A. Kermani
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The viability of rapid thermal processing is assessed for the fabrication of extremely shallow emitter-base profiles in bipolar devices. Junctions diffused from polysilicon using either rapid thermal processing (RTP) or conventional furnace drives are characterized using secondary ion mass spectrometry (SIMS). Results are compared to SUPREM III simulations of the diffusion process. Electrical data is compared for npn polysilicon emitter bipolar devices with emitter-base junctions fabricated using either an RTP emitter drive at 10500C or a conventional furnace drive at 9100C. Potential advantages and disadvantages of RTP are discussed including polysilicon/silicon interface control and required temperature uniformity.

Paper Details

Date Published: 6 April 1990
PDF: 12 pages
Proc. SPIE 1189, Rapid Isothermal Processing, (6 April 1990); doi: 10.1117/12.963954
Show Author Affiliations
J. E. Turner, Hewlett Packard (United States)
C. I. Drowley, Hewlett Packard (United States)
P. Vande Voorde, Hewlett Packard (United States)
S. J. Rosner, Hewlett Packard (United States)
A. Kermani, Rapro Technology (United States)


Published in SPIE Proceedings Vol. 1189:
Rapid Isothermal Processing
Rajendra Singh, Editor(s)

© SPIE. Terms of Use
Back to Top