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Proceedings Paper

Recent Applications Of Finely Focused Eb/Ib Tecindlogies For Multichamber And In-Situ Processing
Author(s): H. Sawaragi; H. Kasahara; R. Mimura; M. Obata; R. Aihara; W. B. Thompson; M. H. Shearer
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Paper Abstract

Finely focused ion and electron beams have been applied to processes of etching, implantation, and monitoring in multichamber in-situ processing systems. Each application has been evaluated and some remarkable achievements are reported.

Paper Details

Date Published: 15 February 1990
PDF: 7 pages
Proc. SPIE 1188, Multichamber and In-Situ Processing of Electronic Materials, (15 February 1990); doi: 10.1117/12.963944
Show Author Affiliations
H. Sawaragi, JEOL Ltd. (Japan)
H. Kasahara, JEOL Ltd. (Japan)
R. Mimura, JEOL Ltd. (Japan)
M. Obata, JEOL Ltd. (Japan)
R. Aihara, JEOL Ltd. (Japan)
W. B. Thompson, JEOL USA Inc . (United States)
M. H. Shearer, JEOL USA Inc . (United States)


Published in SPIE Proceedings Vol. 1188:
Multichamber and In-Situ Processing of Electronic Materials
Robert S. Freund, Editor(s)

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