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Proceedings Paper

In-Situ Cluster Processing For Advanced Semiconductor Technologies
Author(s): Edward Matuszak; Craig Hill; David Horak
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Paper Abstract

Each generation of VLSI semiconductor technology is more complex than the previous generation. Therefore, to help minimize manufacturing costs, turnaround time and defect levels, process clustering has become an attractive alternative to traditional, nonclustering processing. A unique application to cluster processing is in-situ cluster processing, defined as multiprocess steps using various chambers under vacuum inside a single machine. The use of four single wafer reactors (SWR) combined with a common load-lock capable of deposition and etch processes was examined for spacer processes. Two examples will be discussed in some detail: spacer formation and recess/collar formation.

Paper Details

Date Published: 15 February 1990
PDF: 12 pages
Proc. SPIE 1188, Multichamber and In-Situ Processing of Electronic Materials, (15 February 1990); doi: 10.1117/12.963943
Show Author Affiliations
Edward Matuszak, IBM General Technology Division (United States)
Craig Hill, IBM General Technology Division (United States)
David Horak, IBM General Technology Division (United States)


Published in SPIE Proceedings Vol. 1188:
Multichamber and In-Situ Processing of Electronic Materials
Robert S. Freund, Editor(s)

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