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Proceedings Paper

Multi-Chamber Deposition System And Its Application To Vlsi Manufacturing Process
Author(s): Kenji Numajiri; Tetsuo Ishida; Nobuyuki Takahashi
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Paper Abstract

The rapid progress of VLSI processing technology has recently raised a new demand for production equipment which is capable of multiple processes sequentially in the multi-chamber system. Mutli-chamber concept seems to be the major trend in the efforts to achieve development and production of sub-micron devices.

Paper Details

Date Published: 15 February 1990
PDF: 6 pages
Proc. SPIE 1188, Multichamber and In-Situ Processing of Electronic Materials, (15 February 1990); doi: 10.1117/12.963933
Show Author Affiliations
Kenji Numajiri, Anelva Corpration (Japan)
Tetsuo Ishida, Anelva Corpration (Japan)
Nobuyuki Takahashi, Anelva Corpration (Japan)


Published in SPIE Proceedings Vol. 1188:
Multichamber and In-Situ Processing of Electronic Materials
Robert S. Freund, Editor(s)

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