Share Email Print
cover

Proceedings Paper

Multi-Chamber Deposition System And Its Application To Vlsi Manufacturing Process
Author(s): Kenji Numajiri; Tetsuo Ishida; Nobuyuki Takahashi
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The rapid progress of VLSI processing technology has recently raised a new demand for production equipment which is capable of multiple processes sequentially in the multi-chamber system. Mutli-chamber concept seems to be the major trend in the efforts to achieve development and production of sub-micron devices.

Paper Details

Date Published: 15 February 1990
PDF: 6 pages
Proc. SPIE 1188, Multichamber and In-Situ Processing of Electronic Materials, (15 February 1990); doi: 10.1117/12.963933
Show Author Affiliations
Kenji Numajiri, Anelva Corpration (Japan)
Tetsuo Ishida, Anelva Corpration (Japan)
Nobuyuki Takahashi, Anelva Corpration (Japan)


Published in SPIE Proceedings Vol. 1188:
Multichamber and In-Situ Processing of Electronic Materials
Robert S. Freund, Editor(s)

© SPIE. Terms of Use
Back to Top