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Proceedings Paper

STARR: Stepper Test Alignment Resolution Reticle For The Lithographic Characterization Of A Sub-Micron Stepper
Author(s): Robert P. Hardin; Mark P. Gulden
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Paper Abstract

This paper describes the design and implementation of a custom reticle developed as part of a sub-micron stepper evaluation program. The 5X reticle was designed so that all major commercially available steppers could be directly compared. It has a unique arrangement of optical and electrical registration test structures allowing for three levels of processing which provides a true measure of the registration capabilities of a system. The reticle has a number of structures which can be used to evaluate the imaging quality of a stepper system. These include a "Focus Star" structure designed to allow easy evaluation of resolution, focus, and astigmatism, a defect structure to measure the printability of commonly seen reticle defects, and L-bar patterns. The remainder of the reticle is intended for use in analyzing other lithographic problems such as proximity effects, substrate induced reflections, step coverage, and critical dimension control.

Paper Details

Date Published: 20 August 1986
PDF: 9 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963735
Show Author Affiliations
Robert P. Hardin, Sperry Corp. (United States)
Mark P. Gulden, Sperry Corp. (United States)

Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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