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Proceedings Paper

Enhanced Performance Of Optical Lithography Using The DESIRE System
Author(s): Fedor Coopmans; Bruno Roland
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Paper Abstract

We report on the impact of the use of the DESIRE system in optical lithography. Results obtained with first and second generation resists are compared with the performance of the DESIRE system. This comparative study was done for scanning projection, lx stepper and reduction stepper equipment. The in-process compatibility of the new dry developed resist system is described. Thermal stability up to 300°C and good resistance to dry etching are reported. Also the impact of the addition of a color dye to the DESIRE-resin on the line-width control is demonstrated.

Paper Details

Date Published: 20 August 1986
PDF: 8 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963730
Show Author Affiliations
Fedor Coopmans, IMEC vzw (Belgium)
Bruno Roland, UCB N.V. (Belgium)


Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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