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Proceedings Paper

An Analysis Of The Relevance To Linewidth Control Of Various Aerial Image Characteristics
Author(s): Graeme D. Maxwell; Rene Vervoordeldonk
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Paper Abstract

The results of a simulation study into various aerial image characteristics are presented, and these characteristics are shown to relate to features of the simulated developed resist profile. The results were obtained using the simulation program SPESA, and a related program VARYIM: - A novel method of presenting image characteristics over the full line/spacewidth domain will be introduced. - Relative intensity at the mask edge and lateral position of an intensity threshold are shown to be good indicators for developed feature size. - Intensity gradient at the mask edge is an indicator for lattitude with respect to dose, development and focus variations. - Image contrast and the maximum and minimum image intensities are not very useful as indicators either for developed feature size or process latitude.

Paper Details

Date Published: 20 August 1986
PDF: 11 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963724
Show Author Affiliations
Graeme D. Maxwell, University of Edinburgh (Scotland)
Rene Vervoordeldonk, Philips Research Labs (The Netherlands)


Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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