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Proceedings Paper

Clear Defect Photolithographic Mask Repair In Open Air Using Laser-Induced Pyrolytic Decomposition
Author(s): Zbigniew Drozdowicz; Joel Bornstein; John O'Connor
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Paper Abstract

We are describing a visible wavelength laser driven pyrolytic decomposition of metal carbonyls. Micrometer resolution deposits generated by this process are used to repair clear defects (missing chrome) on photolithographic masks. The process takes place in an open air environment with partial atmosphere control achieved by supply gas flow and venting arrangements. Writing speeds of 5 micrometer per second are achieved with room temperature operation.

Paper Details

Date Published: 20 August 1986
PDF: 6 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963717
Show Author Affiliations
Zbigniew Drozdowicz, Quantronix Corporation (United States)
Joel Bornstein, Quantronix Corporation (United States)
John O'Connor, Quantronix Corporation (United States)

Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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