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Proceedings Paper

Design-Data Based Inspection Of Photomasks And Reticles
Author(s): Seiichi Yabumoto; Tetsuyuki Arai; Yoshihiko Fujimori; Toru Azuma
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Paper Abstract

A New automatic design-based inspection system called Nikon RMX has been developed. With its unique algorithm of comparing photomasks and reticles with their design data, good defect detection sensitivity and low false-defect detection are achieved. Firstly, the design data are converted into Nikon Format Data and stored in a magnetic disc device. At this time, more than one files can be merged together. A magnified image of the sample on the X-Y stage is converted to a bit-pattern image. Synchronized to the image of sample, Nikon Format Data are transferred from the disc, and a bit-pattern image of design data is generated on the frame memory. The window moves pixel by pixel in both design and sample bit-patterns. Each minute character (corner, step & isolated pattern) at the same window position is extracted by using so called Template-matching method, and compared. If the characters of the two bit-patterns are different, it means that the sample has a defect. Many kinds of templates are provided for defects on pattern edge (of 0°, 45°, 90° & any angle), defects at corner and isolated defects. Another unique point of this system is automatic resizing function (enlarging or shrinking of pattern). With this function, design-image can be matched to the sample-image precisely. All of defect analysis is performed by hardware-logic, so very fast inspection is possible.

Paper Details

Date Published: 20 August 1986
PDF: 8 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963713
Show Author Affiliations
Seiichi Yabumoto, Nippon Kogaku K.K. (Japan)
Tetsuyuki Arai, Nippon Kogaku K.K. (Japan)
Yoshihiko Fujimori, Nippon Kogaku K.K. (Japan)
Toru Azuma, Nippon Kogaku K.K. (Japan)

Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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