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Proceedings Paper

Impact Of 1X Reticle Defects For Submicron Production Lithography
Author(s): K. L. Zollinger; C. P. O'Mahony; M. S. Chang
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Paper Abstract

A new test reticle with programmed defects has been designed to evaluate the impact of 1X reticle defects for micron and submicron design rules. This reticle has been used to examine the performance of the present generation of automatic reticle inspection systems, as well as to investigate the printability of defects using a 1 um 1X lens. Printability of contact holes, shaped contacts, and pinholes have been compared. Conclusions relevant to the manufacture of 1X reticles for micron and submicron device work are presented here.

Paper Details

Date Published: 20 August 1986
PDF: 7 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963711
Show Author Affiliations
K. L. Zollinger, Ultratech Stepper Corp. (United States)
C. P. O'Mahony, Ultratech Stepper Corp. (United States)
M. S. Chang, Seeq Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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