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Proceedings Paper

Electrical Methods For Precision Stepper Column Optimization
Author(s): Ludwik J. Zych; Gianpaolo Spadini; Talat F. Hasan; Beth A. Arden
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Paper Abstract

This paper presents a quick and accurate method for determining optical column misalignment and degree of telecentricity of a precision wafer stepper using computerized electrical techniques. The trend toward increasingly difficult device design rules has driven the present demand for ultimate stepper performance, which requires the optimization of column alignment and telecentricity, along with the routine monitoring of standard parameters including translation, rotation, magnification, trapezoid and distortion. Device designs using a full-lens field and requiring complex processing, involving large topographical steps, are especially demanding.

Paper Details

Date Published: 20 August 1986
PDF: 8 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963708
Show Author Affiliations
Ludwik J. Zych, VLSI Technology, Inc. (United States)
Gianpaolo Spadini, VLSI Technology, Inc. (United States)
Talat F. Hasan, Prometrix Corp (United States)
Beth A. Arden, Prometrix Corp (United States)

Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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