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Proceedings Paper

Direct-Referencing Automatic Two-Points Reticle-To-Wafer Alignment Using A Projection Column Servo System
Author(s): M. A. v. d. Brink; H. F. D. Linders; S. Wittekoek
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Paper Abstract

An improved version of the Philips/ASM-L phase grating alignment system is described. The new system can be used in combination with standard, single-sided telecentric projection lenses, by using a spatial filter external to the lens. In addition, the alignment-detection has been extended to a double system which enables direct control of magnification and die rotation. Long-term frame instability and changes in environmental conditions such as temperature and barometric pressure have no influence on the overlay accuracy. The new external spatial filtering technique gives the same proven benefits as the earlier spatial filtering which was built internal to the lenses. A comparison of this alignment scheme with other methods is given, showing that this new scheme is superior in terms of dependence on external influences.

Paper Details

Date Published: 20 August 1986
PDF: 12 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963703
Show Author Affiliations
M. A. v. d. Brink, ASM Lithography (The Netherlands)
H. F. D. Linders, ASM Lithography (The Netherlands)
S. Wittekoek, ASM Lithography (The Netherlands)


Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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