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Proceedings Paper

Excimer Laser Projection Patterning With And Without Resists: Submicrometer Etching Of Diamond And Diamond-Like Carbon Resist
Author(s): M. Rothschild; C. Arnonet; D. J. Ehrlich
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Paper Abstract

Recently reported experiments in which the deep-UV (193-nm) and VUV (157-nm) output of an excimer laser has been applied to submicrometer patterning are reviewed. New methods have been designed to take advantage of the short-wavelength, high-peak-intensity pulsed radiation from these sources. The examples of patterning of crystalline diamond and diamond-like carbon films are discussed. Lines and spaces of 0.13 μm have been obtained using diamond-like hard carbon films as self-developing resists.

Paper Details

Date Published: 20 August 1986
PDF: 9 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963702
Show Author Affiliations
M. Rothschild, Massachusetts Institute of Technology (United States)
C. Arnonet, Massachusetts Institute of Technology (United States)
D. J. Ehrlich, Massachusetts Institute of Technology (United States)

Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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