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Proceedings Paper

A Glimpse Into The Future Of Optical Lithography
Author(s): Harry L. Stover
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Paper Abstract

The conference papers relating to resolution and overlay of exploratory but production-worthy exposure/alignment systems indicate performance far exceeding current IC manufacturing demands, and hence give a glimpse of future production systems and design rules. A summary table is presented.

Paper Details

Date Published: 20 August 1986
PDF: 4 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963696
Show Author Affiliations
Harry L. Stover, ASM Lithography (The Netherlands)

Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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