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Proceedings Paper

An Expansible EB System For Submicron Lithography
Author(s): Kazumitsu Nakamura; Akira Yanagisawa; Yoshio Sakitani; Tsutomu Komoda
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Paper Abstract

A variable shaped beam type, high accuracy high throughput EB system Model HL-600 was developed a few years ago. It has been investigated how to apply this system to higher throughput and submicron fabrication. In order to increase throughput, some modifications have been done for controlling two sets of EB units by single computer system. According to some experiments, it has been made clear that this system is applicable to a quarter micron fabrication.

Paper Details

Date Published: 30 June 1986
PDF: 7 pages
Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963690
Show Author Affiliations
Kazumitsu Nakamura, Hitachi, Ltd. (Japan)
Akira Yanagisawa, Hitachi, Ltd. (Japan)
Yoshio Sakitani, Hitachi, Ltd. (Japan)
Tsutomu Komoda, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 0632:
Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V
Phillip D. Blais, Editor(s)

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