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Proceedings Paper

Toward Submicron A New Phase Of Optical Stepper
Author(s): Akiyoshi Suzuki; Ryusho Hirose; Youichi Hirabayashi
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Paper Abstract

According to the progress of the LSI design rule, optical lithography has steadily opened its new frontier. As the dimension of the LSI design rules becomes the same as that of the resolution limit, the required image quality becomes higher and higher. Optical lithography corresponded to such requirements by the development of the lens design and simulation technique. Some of the new results are shown in this paper, and the new submicron stepper of 0.8 μm shall be introduced as the fruit of such technique. In addition, some of the new developments which correspond to the submicron lithography are introduced. As a consequence, the future of optical lithography shall be discussed in view of the recent aim of 0.5 μm.

Paper Details

Date Published: 30 June 1986
PDF: 7 pages
Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963681
Show Author Affiliations
Akiyoshi Suzuki, Canon Inc. (Japan)
Ryusho Hirose, Canon Inc. (Japan)
Youichi Hirabayashi, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 0632:
Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V
Phillip D. Blais, Editor(s)

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