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Proceedings Paper

Advanced X-Ray Alignment System
Author(s): B. S. Fay; W. T. Novak
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Paper Abstract

Step and repeat X-ray lithography is essential for achieving the fine lines, accurate registration, and extreme density required to produce the next generation of very large scale integrated circuits. Drawing upon its own experience in developing a full-field X-ray lithography system [1], as well as upon technology developed at companies such as Thomson-CSF [2] and AT&T [3], Micronix Corporation in Los Gatos, California, is introducing such a system, called the MX-1600.

Paper Details

Date Published: 30 June 1986
PDF: 10 pages
Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963679
Show Author Affiliations
B. S. Fay, Micronix Corporation (United States)
W. T. Novak, Micronix Corporation (United States)


Published in SPIE Proceedings Vol. 0632:
Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V
Phillip D. Blais, Editor(s)

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