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Proceedings Paper

Characteristics Of A Gas-Puff Z-Pinch Plasma X-Ray Source
Author(s): Hideo Yoshihara; Ikuo Okada; Yasunao Saitoh; Seiichi Itabashi
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Paper Abstract

A high brightness plasma x-ray source is developed. This source can be linked to a conventional aligner by directing x-rays downwards into the atmosphere. By adopting the low pressure gas injection method, a wide discharge timing margin and strong x-ray emission are attained. X-rays having line spectra of 9-14 Å in wavelength are emitted from the Neon gas plasma. As high mask contrast can be obtained, submicron resist patterns can easily be replicated by using a 0.4 μm thick Ta absorber. The mask distortion due to mask heating is not a serious problem in He atmospheric exposure. The exposure time is about 13 seconds with a 3 Hz discharge repetition rate. Compared with a conventional source, a throughput 10 times greater is achieved.

Paper Details

Date Published: 30 June 1986
PDF: 6 pages
Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963677
Show Author Affiliations
Hideo Yoshihara, NTT Electrical Communications Laboratories (Japan)
Ikuo Okada, NTT Electrical Communications Laboratories (Japan)
Yasunao Saitoh, NTT Electrical Communications Laboratories (Japan)
Seiichi Itabashi, NTT Electrical Communications Laboratories (Japan)

Published in SPIE Proceedings Vol. 0632:
Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V
Phillip D. Blais, Editor(s)

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