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Proceedings Paper

Mask Technology For X-Ray Step-And-Repeat System
Author(s): A. R. Shimkunas; J. J. LaBrie; P. E. Mauger; J. J. Yen
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Paper Abstract

An x-ray mask suitable for use with a new x-ray step-and-repeat alignment system [1] is introduced. Design features are described which distinguish this stepper mask from the full-field x-ray mask reported earlier [2]. Processes for manufacturing such masks, patterned additively or subtractively, are described, as is the e-beam imaging technique. Finally, mask distortion results are presented and discussed with relation to mask design.

Paper Details

Date Published: 30 June 1986
PDF: 12 pages
Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963675
Show Author Affiliations
A. R. Shimkunas, Micronix Corporation (United States)
J. J. LaBrie, Micronix Corporation (United States)
P. E. Mauger, Micronix Corporation (United States)
J. J. Yen, Micronix Corporation (United States)


Published in SPIE Proceedings Vol. 0632:
Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V
Phillip D. Blais, Editor(s)

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