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Proceedings Paper

Submicron Proximity Correction By The Fourier Precompensation Method
Author(s): Michael E. Haslam; John F. McDonald
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Paper Abstract

The Fourier and Haar transforms have been successfully employed to produce fast, efficient proximity correction calculations for electron beam lithography. The Fourier transform is used in a precompensation operation that generates a nearly exact solution to the proximity problem. The Haar transform is used to thin or reduce the size of the extremely accurate but large corrected database that results. The methodology here constitutes a signal processing or transform oriented approach to proximity correction. It has the advantage that fast digital hardware is commercially available for making accelerated computations. Detailed computer generated simulations and experimental results are presented for four different test patterns. The critical lithography features are nested gaps between large features and isolated lines and squares ranging from 0.2 to 0.5 μm. The Fourier precompensation proximity correction approach successfully preserves the fidelity of these features as well as all other features in the test patterns.

Paper Details

Date Published: 30 June 1986
PDF: 12 pages
Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963667
Show Author Affiliations
Michael E. Haslam, Rensselaer Polytechnic Institute (United States)
John F. McDonald, Rensselaer Polytechnic Institute (United States)


Published in SPIE Proceedings Vol. 0632:
Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V
Phillip D. Blais, Editor(s)

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