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Proceedings Paper

Advanced Topics In Lithography Modeling
Author(s): Chris A. Mack
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Paper Abstract

The model PROLITH is used to simulate advanced topics in lithography such as multi-level resists, contrast enhancement lithography, linewidth variations over topography, antireflective coatings, post-exposure bakes, and dyed photoresists. The applicability and usefulness of this model for these topics is discussed. Other areas in which the model PROLITH may be applied are suggested.

Paper Details

Date Published: 9 July 1986
PDF: 12 pages
Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963652
Show Author Affiliations
Chris A. Mack, Department of Defense (United States)


Published in SPIE Proceedings Vol. 0631:
Advances in Resist Technology and Processing III
C. Grant Willson, Editor(s)

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