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Proceedings Paper

Surface Tension Effects In Microlithography - Striations
Author(s): Brian K. Daniels; Charles R. Szmanda; Michael K. Templeton; Peter Trefonas
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Paper Abstract

Surface tension plays a role in many areas of lithography. One of them has been found to be formation of Benard cells in photoresist coatings at the center of a wafer. A relationship between these cells and ,'riations is proposed. Observations of the effects of evaporation, gravity, radius, dispense flow, spiv, lme, spin speed, type of solvent, type of solute and concentration of surfactant suggest that the formation of cells and striations follows the same principles that are active in conventional thick coatings. Surface tension measurements are reported that support this conclusion.

Paper Details

Date Published: 9 July 1986
PDF: 10 pages
Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963641
Show Author Affiliations
Brian K. Daniels, Monsanto Electronic Materials Company (United States)
Charles R. Szmanda, Monsanto Electronic Materials Company (United States)
Michael K. Templeton, Monsanto Electronic Materials Company (United States)
Peter Trefonas, Monsanto Electronic Materials Company (United States)


Published in SPIE Proceedings Vol. 0631:
Advances in Resist Technology and Processing III
C. Grant Willson, Editor(s)

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