Proceedings Paper
Desire : A Novel Dry Developed Resist System| Format | Member Price | Non-Member Price |
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Paper Abstract
We introduce the DESIRE system, a noval approach to dry developed resist systems. DESIRE is a single layer system based on selective silylation. The optical spatial information is translated into silicon being built into the resin during the silylation treatment. A negative working version will be discussed. The process flow is given and a set of results showing submicron dimensions with high aspect ratio and good linewidth control are presented. The excellent features of the system make it a possible candidate for use in submicron applications with UV exposure tools.
Paper Details
Date Published: 9 July 1986
PDF: 6 pages
Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963623
Published in SPIE Proceedings Vol. 0631:
Advances in Resist Technology and Processing III
C. Grant Willson, Editor(s)
PDF: 6 pages
Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963623
Show Author Affiliations
Fedor Coopmans, IMEC vzw (Belgium)
Bruno Roland, UCB N.V. (Belgium)
Published in SPIE Proceedings Vol. 0631:
Advances in Resist Technology and Processing III
C. Grant Willson, Editor(s)
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