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Proceedings Paper

Bidirectional Method For Optical Channel Waveguide Attenuation Measurement By Detectors Integrated On The Wafer
Author(s): Jaakko Aarnio; Matti Leppihalme
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Paper Abstract

A new on-wafer bidirectional nondestructive measurement method is demonstrated for measuring losses in three dimensional integrated optical waveguides. A thermally oxidized silicon wafer is used as substrate for silicon nitride multimode waveguides. The measurement is based on p-i-n photodetectors integrated near the waveguide. In order to eliminate the effect of different sensitivities of adjacent p-i-n detectors, the light is launched separately to both ends of the waveguide. The method can be applied to test structures in optoelectronic integrated circuits (OEIC's).

Paper Details

Date Published: 5 January 1990
PDF: 6 pages
Proc. SPIE 1177, Integrated Optics and Optoelectronics, (5 January 1990); doi: 10.1117/12.963331
Show Author Affiliations
Jaakko Aarnio, Technical Research Centre of Finland (Finland)
Matti Leppihalme, Technical Research Centre of Finland (Finland)


Published in SPIE Proceedings Vol. 1177:
Integrated Optics and Optoelectronics
Leon McCaughan; Mark A. Mentzer; Song-Tsuen Peng; Henry J. Wojtunik; Ka Kha Wong, Editor(s)

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