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Proceedings Paper

Holographic Multilayer Versus Dielectric Multilayer Optics For XUV Applications
Author(s): Tomasz Jannson; Gajendra Savant
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Paper Abstract

Conventional state-of-the-art XUV optical systems are hampered by their low laser damage threshold, pinhole effects, folding and poor adhesion of interfaces in addition to being inefficient in adverse environments. Dielectric multilayer coating approaches require high temperature and high vacuum conditions, and large structures or unconventional shapes can hardly be made. Physical Optics Corporation's recent results have demonstrated that XUV multilayer optics can be fabricated via advanced holographic technology from POC's proprietary materials. POC's XUV holographic multilayer technology offers many advantages such as simplification in overall fabrication, normal temperature deposition, much lower fabrication cost, high diffraction efficiency, high laser damage threshold and temperature stability, and scalability to very large optics or nonconventional structures.

Paper Details

Date Published: 28 July 1989
PDF: 12 pages
Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); doi: 10.1117/12.962656
Show Author Affiliations
Tomasz Jannson, Physical Optics Corporation (United States)
Gajendra Savant, Physical Optics Corporation (United States)

Published in SPIE Proceedings Vol. 1160:
X-Ray/EUV Optics for Astronomy and Microscopy
Richard B. Hoover, Editor(s)

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