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Proceedings Paper

W/C Mirror Deposition Optimization
Author(s): A. F. Jankowski
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Paper Abstract

The reflectivity of grazing incidence W/C multilayer mirrors can be optimized by progressively refining structural features through sputter deposition parameter optimization. Beyond the configuration of system geometry, the deposition rate, substrate temperature and working gas pressure significantly affect the multilayer structure morphology. Of these parameters, working gas pressure has an overwhelming effect. The energy and distribution of sputtered adatoms, directly influenced by the sputtering gas pressure, affects the reactivity at and the reconstruction of vapor deposited surfaces. The interface abruptness is therefore affected by working gas pressure. The reduction in interfacial atomic intermixing (hence roughness) generally follows with decreased gas pressure. Correspondingly, the improved reflective efficiency becomes increasingly noticeable from hard to soft x-rays. Structural and reflectivity improvements in the W/C multilayer mirror system, characterized qualitatively using cross-section electron microscopy and quantitatively using x-ray diffraction, will be correlated to an optimization of the sputter deposition parameter - working gas pressure.

Paper Details

Date Published: 28 July 1989
PDF: 7 pages
Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); doi: 10.1117/12.962654
Show Author Affiliations
A. F. Jankowski, Lawrence Livermore National Laboratory (United States)

Published in SPIE Proceedings Vol. 1160:
X-Ray/EUV Optics for Astronomy and Microscopy
Richard B. Hoover, Editor(s)

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