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Proceedings Paper

XUV Optical Characterization Of Thin Film And Multilayer Reflectors
Author(s): D. L. Windt; J. B. Kortright
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Paper Abstract

The measured XUV reflectance versus incidence angle is presented for several multilayer reflectors having various periods, fabricated from W/C, Mo/Si, and Cr3 C2 /C. These measurements are compared with calculations using recently derived optical constants, which are also presented. We find that the agreement between the measured and calculated reflectance is best for non-zero values of the interface roughness parameter.

Paper Details

Date Published: 28 July 1989
PDF: 14 pages
Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); doi: 10.1117/12.962648
Show Author Affiliations
D. L. Windt, AT&T Bell Laboratories (United States)
J. B. Kortright, University of California (United States)


Published in SPIE Proceedings Vol. 1160:
X-Ray/EUV Optics for Astronomy and Microscopy
Richard B. Hoover, Editor(s)

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