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Proceedings Paper

Microfabrication Technologies Applied To The Production Of Large Area Stress Relieved Multilayer Beamsplitters
Author(s): C. Khan Malek; A. Madouri; R. Rivoira; J. Susini; M. Ouahabi; F. R. Ladan; Y. Lepetre; R. Barchewitz
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Paper Abstract

Large area multilayer beamsplitters (1 cm2 ) were produced for use at oblique incidence in the soft X-ray range. Mo/C multilayer reflectors were deposited on top of a self supporting silicon carbide carrier film. The role of the supporting film and the stress induced by the multilayer are addressed. Progress towards optimization of the flatness and transmission enhancement of the beamsplitters (thinning of the carrier layer and adjusting its stress through etching ) is presented. Experimental reflectivity and transmission results at 13.3 Å are compared with theory.

Paper Details

Date Published: 28 July 1989
PDF: 7 pages
Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); doi: 10.1117/12.962626
Show Author Affiliations
C. Khan Malek, Laboratoire de Microstructures et de Microelectronique (France)
A. Madouri, Laboratoire de Microstructures et de Microelectronique (France)
R. Rivoira, UniversitO d'Aix - Marseille III (France)
J. Susini, Laboratoire de Chimie Physique (France)
M. Ouahabi, Laboratoire de Chimie Physique (France)
F. R. Ladan, Laboratoire de Microstructures et de Microelectronique (France)
Y. Lepetre, UniversitO d'Aix - Marseille III (France)
R. Barchewitz, Laboratoire de Chimie Physique (France)

Published in SPIE Proceedings Vol. 1160:
X-Ray/EUV Optics for Astronomy and Microscopy
Richard B. Hoover, Editor(s)

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