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Proceedings Paper

Optical Properties Of Microwave-Plasma-Assisted-CVD Diamond Film
Author(s): Curtis E. Johnson; Wayne A. Weimer
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Paper Abstract

Infrared spectra were obtained from diamond films grown on Si wafers by microwave plasma assisted chemical vapor deposition. The transmission of a 3-μm thick film varied from near 60% at 5000 cm-1 to near 73% at 1000 cm-1. Infrared spectra were fit with simulated spectra to determine values for thickness, index of refraction, and surface roughness or thickness variation. Impurity peaks at 2925-2830 cm-1 and 3325 cm-1 were assigned to sp3 carbon CH2 or CH groups and sp carbon CH groups, respectively.

Paper Details

Date Published: 15 January 1989
PDF: 4 pages
Proc. SPIE 1146, Diamond Optics II, (15 January 1989); doi: 10.1117/12.962076
Show Author Affiliations
Curtis E. Johnson, Naval Weapons Center (United States)
Wayne A. Weimer, Naval Weapons Center (United States)


Published in SPIE Proceedings Vol. 1146:
Diamond Optics II
Albert Feldman; Sandor Holly, Editor(s)

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