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Proceedings Paper

Properties Of Low Temperature Plasma CVD Diamond Films
Author(s): Alan B. Harker
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Paper Abstract

In the microwave plasma deposition (PECVD) of diamond from methane, the variables available for controlling the microstructure of the resulting films are the plasma composition and density, the substrate surface properties, and the temperature. It has been demonstrated that the competition between nucleation site formation and the rate of reactive plasma etching is the critical feature in the development of the film microstructure. Through reducing the deposition temperature and enhancing the etching rates of sp2 carbon, fine grained optical quality diamond films have been produced.

Paper Details

Date Published: 15 January 1989
PDF: 7 pages
Proc. SPIE 1146, Diamond Optics II, (15 January 1989); doi: 10.1117/12.962072
Show Author Affiliations
Alan B. Harker, Rockwell International Science Center (United States)


Published in SPIE Proceedings Vol. 1146:
Diamond Optics II
Albert Feldman; Sandor Holly, Editor(s)

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