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Proceedings Paper

Pulsed Laser Deposition Of Amorphous Carbon Films
Author(s): R. T. Demers; D. G. Harris
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Paper Abstract

We have deposited thin amorphous carbon films on various substrate materials by irradiating a high purity (5N) graphite target in vacuum with pulsed light at 248 nm from a KrF excimer laser. The films have been characterized by Raman scattering, AES, SEM and chemical inertness tests. The films deposited on silicon are smooth and partially transparent. The preliminary Raman spectra show no evidence of crystalline grains (diamond or graphite) however the films deposited on silicon and quartz survived etching by a solution of HF:HNO3 (1:1). We will report on the substrate temperature dependence of laser deposited films and the variation of film quality on substrate material.

Paper Details

Date Published: 15 January 1989
PDF: 8 pages
Proc. SPIE 1146, Diamond Optics II, (15 January 1989); doi: 10.1117/12.962061
Show Author Affiliations
R. T. Demers, Rocketdyne Division of Rockwell International (United States)
D. G. Harris, Rocketdyne Division of Rockwell International (United States)


Published in SPIE Proceedings Vol. 1146:
Diamond Optics II
Albert Feldman; Sandor Holly, Editor(s)

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