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Proceedings Paper

Multilayers For X- In Optics
Author(s): J. P. Chauvineau
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Paper Abstract

The design and preparation of multilayers for X-UV Schwarzschild microscopes for laser created plasmas imaging is described. WRe/Si, Mo/Si, and Rh/C multilayers have been made for imaging at 30.4 nm, 15.5 nm, and 11.4 rim respectively. In order to evaluate the transmission of the optical system, the lateral thickness variation of the multilayers is calculated from the geometrical characteristics of the deposition system. The interface roughness, deduced from the value of the relectivity as a function of thickness measured during the multilayer deposition, is taken into account for the calculation of the multilayer reflectivity.

Paper Details

Date Published: 27 November 1989
PDF: 8 pages
Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); doi: 10.1117/12.961861
Show Author Affiliations
J. P. Chauvineau, Universite Paris XI (France)


Published in SPIE Proceedings Vol. 1140:
X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation

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