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Proceedings Paper

Laser Plasma X-Ray Source And Its Application To Lithography
Author(s): K. A. Tanaka; H. Aritome; T. Kanabe; M. Nakatsuka; T. Yamanaka; S. Nakai
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Paper Abstract

Laser plasma is a unique source of high brightness ( > 1010 W/cm2) and pulsive ( <10-9 sec. ) x rays. X-ray spectrum and intensity can be controlled by carefully choosing various experimental parameters such as laser wavelength, target material, and laser pulse width. These detailed knowledge of laser plasma x rays (LAPLAX) may be used for many applications. X-ray lithography is one such example, which is to achieve less than a few thousand Å spatial resolution. Making use of LAPLAX,we propose a conceptual design of an x-ray lithography system.

Paper Details

Date Published: 27 November 1989
PDF: 8 pages
Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); doi: 10.1117/12.961844
Show Author Affiliations
K. A. Tanaka, Osaka University (Japan)
H. Aritome, Osaka University (Japan)
T. Kanabe, Osaka University (Japan)
M. Nakatsuka, Osaka University (Japan)
T. Yamanaka, Osaka University (Japan)
S. Nakai, Osaka University (Japan)


Published in SPIE Proceedings Vol. 1140:
X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation

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