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Proceedings Paper

X-Ray Laser Microscopy
Author(s): S. Suckewer; D. DiCicco; D. Kim; L. Meixler; C. H. Nam; J. Robinson; C. H. Skinner; W. Tighe
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Paper Abstract

This paper describes work at Princeton on X-ray laser microscopy. Related to this work is a new system for the development of an X-ray laser in the wavelength region from 5 nm to 1 nm utilizing a Powerful Sub-Picosecond Laser (PP-Laser) of expected peak power up to 0.5 TW in a 300 fs pulse. Soft X-ray spectra generated by the interaction of the PP-Laser beam with different targets are presented and compared to the spectra generated by a much less intense laser beam (20-30 GW). The development of additional amplifiers for the recombining soft X-ray laser and the design of a cavity are presented from the point of view of applications for X-ray microscopy and microlithography.

Paper Details

Date Published: 27 November 1989
PDF: 8 pages
Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); doi: 10.1117/12.961800
Show Author Affiliations
S. Suckewer, Princeton University Plasma Physics Laboratory (United States)
D. DiCicco, Princeton University Plasma Physics Laboratory (United States)
D. Kim, Princeton University Plasma Physics Laboratory (United States)
L. Meixler, Princeton University Plasma Physics Laboratory (United States)
C. H. Nam, Princeton University Plasma Physics Laboratory (United States)
J. Robinson, Princeton University Plasma Physics Laboratory (United States)
C. H. Skinner, Princeton University Plasma Physics Laboratory (United States)
W. Tighe, Princeton University Plasma Physics Laboratory (United States)


Published in SPIE Proceedings Vol. 1140:
X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation

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