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Proceedings Paper

The Plasma Focus As Soft X-Ray Source For Microscopy And Lithography
Author(s): W. Neff; J Eberle; R. Holz; R. Lebert; F. Richter
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Paper Abstract

Plaafocs devices producing small volume of plasma with electron density ne ≈ 1020 cm-3 and mean particle energy of about 1 keV seem to meet the requirements for compact X-ray sources for industrial use. Their emission properties can be taylored for X-ray microscopy where narrowband emission with high spectral brilliance in the water window (2.4 nm to 4.3 nm) is required, as well as for X-ray lithography demanding for high mean power in the wavelength region from 0.7 nm to 1.0 nm. For X-ray microscopy the emission of Lyman-a lines is of advantage whereas for X-ray lithography the broadband continuum and line radiation can be used. For X-ray microscopy a single pulse source using the is - 2p line of nitrogen VII at 2.48 nm and for X-ray lithography a source running with several Hz repetition rate using the emission of hydrogen- and heliumlike neon ions around 1 nm are being developed.

Paper Details

Date Published: 27 November 1989
PDF: 8 pages
Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); doi: 10.1117/12.961796
Show Author Affiliations
W. Neff, Fraunhofer Institut fur Lasertechnik (Germany)
J Eberle, Fraunhofer Institut fur Lasertechnik (Germany)
R. Holz, Fraunhofer Institut fur Lasertechnik (Germany)
R. Lebert, RWTH Lehrstuhl fur Lasertechnik (Germany)
F. Richter, Fraunhofer Institut fur Lasertechnik (Germany)


Published in SPIE Proceedings Vol. 1140:
X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation

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