Proceedings PaperPrecision Measurement Of Micro-Images
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New methods of measuring micro-images, needed during the fabrication of integrated optics and semiconductors, are currently receiving much attention. Edge location and linewidth measurements to sub-micron accuracy are required to be made at high speed, but conventional high resolution optical microscopy is not always suitable due to the small depth-of-focus and sensitivity to vibration associated with high numerical aperture lenses. This paper describes the design and performance of a comparator microscope which, although originally suggested for quantifying surface flaws, can also be applied to measuring linewidths and for precise edge location. The technique, which is still under development, shows promise in enabling high precision measurements on some types of image using relatively low aperture, large depth-of-focus lenses.