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Proceedings Paper

Ultra-Precise Mask Metrology - Development And Practical Results Of A New Measuring Machine
Author(s): H. Feindt; D. Sofronijevic
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Paper Abstract

As circuits with sub-micron structures continue to increase in complexity, previous methods of inspecting overlay and CD tolerances are proven inadequate. Therefore, sponsored by the West German Ministry for Research and Technology, Wild Leitz developed a mask measurement system that represents in terms of achievable accuracy the limit of what is technically possible today. Within this project, Siemens as one of the key customers has performed part of the accuracy tests on a prototype of the machine and is now using a final system in its mask production line with good results.

Paper Details

Date Published: 11 October 1989
PDF: 7 pages
Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); doi: 10.1117/12.961756
Show Author Affiliations
H. Feindt, Consultant (Germany)
D. Sofronijevic, Consultant (Germany)

Published in SPIE Proceedings Vol. 1138:
Optical Microlithography and Metrology for Microcircuit Fabrication
Michel J. Lacombat; Stefan Wittekoek, Editor(s)

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