Share Email Print

Proceedings Paper

Customized Exposure Bandwidth For I-Line Resist Systems
Author(s): John Schaller; Doreen Sa Vieira
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In order to meet the resolution rquirements of future devices while maintaining cost effectiveness and high productivity, a low-cost machine modification was made. A newly designed bandpass filter was produced that optimizes the broadband illumination-based Micralign 500/600 projection aligner for use with i-line resist systems. The wavelength transmission of this new filter was selected to obtain the high-resolution characteristics of the UV-3 spectral range while providing the high throughput associated with the UV-4 spectral range. Performance data obtained under manufacturing conditions with a number of photoresists is presented. It shows that the practical considerations of resolution and depth of focus across the full field of the substrate were enhanced through the use of this bandpass filter. The inherently high throughput of projection systems in addition to one-micron resolution capability in a production process, make the Micralign 600 projection aligner a very cost-effective alternative to stepper systems in the selection of optical lithographic equipment.

Paper Details

Date Published: 11 October 1989
PDF: 9 pages
Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); doi: 10.1117/12.961741
Show Author Affiliations
John Schaller, Standard Microsystems Corporation (United States)
Doreen Sa Vieira, The Perkin-Elmer Corporation (United States)

Published in SPIE Proceedings Vol. 1138:
Optical Microlithography and Metrology for Microcircuit Fabrication
Michel J. Lacombat; Stefan Wittekoek, Editor(s)

© SPIE. Terms of Use
Back to Top