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Proceedings Paper

Single Photomask, Multilevel Kinoforms: Manufacture And Evaluation
Author(s): H. Andersson; M. Ekberg; S. Hard; S. Jacobsson; M. Larsson; T. Nilsson
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Paper Abstract

Kinoforms manufactured in photoresist with photolithographic techniques using a single, ten-level, grey-scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are investigated. Measured diffraction efficiencies exceeded 50 percent.

Paper Details

Date Published: 26 October 1989
PDF: 8 pages
Proc. SPIE 1136, Holographic Optics II: Principles and Applications, (26 October 1989); doi: 10.1117/12.961665
Show Author Affiliations
H. Andersson, Chalmers University of Technology (Sweden)
M. Ekberg, Chalmers University of Technology (Sweden)
S. Hard, Chalmers University of Technology (Sweden)
S. Jacobsson, Chalmers University of Technology (Sweden)
M. Larsson, Chalmers University of Technology (Sweden)
T. Nilsson, Chalmers University of Technology (Sweden)


Published in SPIE Proceedings Vol. 1136:
Holographic Optics II: Principles and Applications
G. Michael Morris, Editor(s)

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