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Proceedings Paper

Undulator For The CLIO Project At Orsay
Author(s): Pierre J. Carlos; Philippe Bourgeois; Jean-Louis Fallou; Paul Garganne; Claude Hezard; Alfred Lepretre; Claude Bazin; Jean-Michel Ortega
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Paper Abstract

The CLIO collaboration (Collaboration pour un Laser Infrarouge a Orsay) started in 1986, in order to build an infrared laser at LURE (Orsay). It includes the design and the construction of a new FEL dedicated RF linear accelerator, to make a tunable laser in a broad wavelength range (typically 2- 20 μm) with a peak power in the MW range and an average power of a few tens of watts. In order to obtain enough gain at low wavelength (λ≈2 μm) together with a good energy extraction at long wavelength, a two component undulator has been designed and built. It is made of two identical 1=0.96 m long undulators with a computer controlled and automatically adjustable magnetic gap, the second undulator being possibly tapered. The undulator period was chosen as λ0=4 cm. Preliminary calculations indicated that the regime in which a half length constant gap undulator is followed by a tapered one provides the best energy extraction. To adjust easily the FEL wavelength, the non hybrid technology was chosen. With a judicious choice of a few electron energies the spectral region from 2 to 20 μm can be spanned by varying the undulator gap between 10 and 30 mm.

Paper Details

Date Published: 26 December 1989
PDF: 6 pages
Proc. SPIE 1133, Free Electron Lasers II, (26 December 1989); doi: 10.1117/12.961596
Show Author Affiliations
Pierre J. Carlos, Institut de Recherche fondamentale (France)
Philippe Bourgeois, Institut de Recherche fondamentale (France)
Jean-Louis Fallou, Institut de Recherche fondamentale (France)
Paul Garganne, Institut de Recherche fondamentale (France)
Claude Hezard, Institut de Recherche fondamentale (France)
Alfred Lepretre, Institut de Recherche fondamentale (France)
Claude Bazin, Universite Paris-Sud (France)
Jean-Michel Ortega, Universite Paris-Sud (France)


Published in SPIE Proceedings Vol. 1133:
Free Electron Lasers II

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