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Proceedings Paper

Interferometry In Microlithography
Author(s): A. G. Shapiro; P. F. Makiyenkov
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Paper Abstract

A simple method based on the interferometry principles was developed for control and analysis of photoresist layers at the stages of their thermal treatment and exposure. Application of this method makes it possible to increase integration of VLSI by creating elements with characteristic measures less than one micron.

Paper Details

Date Published: 3 April 1989
PDF: 3 pages
Proc. SPIE 1121, Interferometry '89, (3 April 1989); doi: 10.1117/12.961336
Show Author Affiliations
A. G. Shapiro, Moscow Aicraft Technology Institute (Russian Federation)
P. F. Makiyenkov, Moscow Aicraft Technology Institute (Russian Federation)

Published in SPIE Proceedings Vol. 1121:
Interferometry '89
Zbigniew Jaroszewicz; Maksymilian Pluta, Editor(s)

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