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Proceedings Paper

Laser Repair Of Transparent Microfaults In IC Photomasks
Author(s): Hp. Preiswerk; C. C. Sheu; S. D. Allen
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Paper Abstract

A laser direct writing method based on the pyrolysis of a thin solid state organometallic film for repairing transparent defects in pholomasks has been developed. The film is applied using standard photoresist spin-coating techniques and a focused Ar laser beam is used to locally decompose the metallo organic coating. This technique is capable of generating submicron opaque metallic features under ambient atmosphere conditions. Experimental results as well as limitinp factors are discussed.

Paper Details

Date Published: 5 August 1986
PDF: 5 pages
Proc. SPIE 0621, Manufacturing Applications of Lasers, (5 August 1986); doi: 10.1117/12.961148
Show Author Affiliations
Hp. Preiswerk, University of Southern California (United States)
C. C. Sheu, University of Southern California (United States)
S. D. Allen, University of Southern California (United States)

Published in SPIE Proceedings Vol. 0621:
Manufacturing Applications of Lasers
Peter K. Cheo, Editor(s)

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